May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...
SAN JOSE, Calif. – As expected, KLA-Tencor Inc. today (June 30) rolled out its next-generation reticle inspection tool for 90-nm designs and below. The new TeraScan deep ultraviolet (DUV) reticle ...
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