One challenge faced by all control systems integrators (CSIs) is the prospect of testing their software before deployment. CSIs often work remotely, without having the actual equipment to manipulate, ...

A novel parallel computing framework for chemical process simulation has been proposed by researchers from the East China University of Science and Technology and the University of Sheffield. This ...

First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

Lithography processes were modeled on the basis of coarse-grained polymer simulation techniques using OCTA, which is the simulation software for soft materials, and the simulations of these processes ...